TOKYO — Dutch lithography equipment maker ASML ... 1250 wafer scanner has been successfully converted for use in immersion lithography and is available for orders. The Twinscan XT:1250i makes use of ...

Q2 net system bookings were €4.5B – €1.6B for EUV and €2.9B for non-EUV (DUV, etc ... logic and memory customers; the ASML EXE:5000 high-NA scanner is expected to able to reach an ...

ASML will keep advancing its DUV and 0.33 NA EUV scanners. High-NA EUV lithography is expected to play a pivotal role in shrinking transistor dimensions and boosting performance.

ASML spent nearly ... work the same as DUV, with the same EUV light source. But there's one key difference. The higher numerical aperture of High NA means it has a larger lens opening, increasing ...

An ASML spokesperson said: "We are shipping the first High NA system ... a 0.55 NA lens that is capable of an 8nm resolution. We should expect these next-gen High-NA EUV scanners to be one of ...

Also, keep in mind that the CAS system is in its early stages of development, and we are talking about a test vehicle at best. DUV lithography machines by ASML, Canon, and Nikon generate 193-nm ...

(2) Net bookings include all system sales ... of around 50%. ASML expects R&D costs of around €1.0 billion and SG&A costs of around €285 million. Due to strong DUV revenue and despite the ...

Deep ultraviolet (DUV) lithography machinery developed by ASML utilizes light that falls within the ultraviolet segment of the electromagnetic spectrum to create the minute features constituting a ...

This came after the revelation that SMIC used ASML tech to manufacture Huawei's latest flagship processor, the 7nm HiSilicon Kirin 9000S. In addition to DUV machines, ASML also manufactures ...