Intel installed and started using two High-NA EUV lithography tools from ASML at its D1 development fab near Hillsboro, Oregon, last year and has now processed as many as 30,000 w ...
High-NA EUV machine to its Hwaseong Campus in South Korea, which is reportedly necessary for the manufacturing of the 2nm ...
Intel has started using two leading-edge ASML High-NA Twinscan EXE:5000 EUV lithography tools, the company revealed on Monday at an industry conference, Reuters reports. The company uses these ...