Extreme ultraviolet (EUV) lithography is at the center of next-generation semiconductor manufacturing as it enables smaller ...

1). Figure 1: Since the mid-1980s, the wavelength of light used in lithography systems has reduced by almost half from 365 nm to 193 nm. Extreme ultraviolet (EUV) lithography is the next step in ...

Individual EUV photons have a lot of energy, but there aren’t very many of them. Feature roughness depends on the interaction ...

High-NA EUV makes progress toward high-volume manufacturing while optical lithography sees continued advances.

China is advancing in extreme ultraviolet (EUV) lithography, with a domestically developed system undergoing testing at ...

Samsung Electronics reportedly deployed its first high-NA Extreme Ultraviolet (EUV) lithography machine at its Hwaseong ...

Many conclude from this that China could soon be producing chips using highly complex extreme ultraviolet (EUV) lithography technology. This would be a huge success for the country, as so far only ...

ASML to install its High-NA EUV lithography tools in Imec's pilot production line to give research and development personnel ...

The move was a shift in strategy for Intel, which lagged rivals in adopting the previous generation of extreme ultraviolet (EUV) lithography machines. It took Intel seven years to put those ...

Intel has started using two leading-edge ASML High-NA Twinscan EXE:5000 EUV lithography tools, the company revealed on Monday at an industry conference, Reuters reports. The company uses these ...