Extreme ultraviolet (EUV) lithography is at the center of next-generation semiconductor manufacturing as it enables smaller ...

Extreme-ultraviolet (EUV) lithography at 13.5 nm is expected to be introduced in high-volume semiconductor chip production over the next three years. Research is now underway to investigate sub-10 ...

High-NA EUV makes progress toward high-volume manufacturing while optical lithography sees continued advances.

1). Figure 1: Since the mid-1980s, the wavelength of light used in lithography systems has reduced by almost half from 365 nm to 193 nm. Extreme ultraviolet (EUV) lithography is the next step in ...

China is advancing in extreme ultraviolet (EUV) lithography, with a domestically developed system undergoing testing at ...

Many conclude from this that China could soon be producing chips using highly complex extreme ultraviolet (EUV) lithography technology. This would be a huge success for the country, as so far only ...

We recently published a list of 9 AI News and Ratings to Keep on Your Radar. In this article, we are going to take a look at ...

computational lithography solutions for OPC including the added complexity of mask 3D effects and non-telecentric optics with a 6-degree chief ray angle, and clean tools for handling, cleaning and ...

Huawei, SMIC reportedly advancing LDP lithography, eye 3Q25 trial, 2026 rollout China is making significant strides in ...

ASML to install its High-NA EUV lithography tools in Imec's pilot production line to give research and development personnel ...

It is used for research into materials such as optics, reticles, and pellicles, in collaboration with various parties in the EUV lithography field, including materials suppliers, end users, and ...