Extreme ultraviolet (EUV) lithography is at the center of next-generation semiconductor manufacturing as it enables smaller ...

Intel has started using two leading-edge ASML High-NA Twinscan EXE:5000 EUV lithography tools, the company revealed on Monday at an industry conference, Reuters reports. The company uses these ...

High-NA EUV makes progress toward high-volume manufacturing while optical lithography sees continued advances.

The Chinese Academy of Physics researchers claim the method can be applied to any metal with a low melting point. This ...

The first phase of the facility, known as Mod 1, should be finished in 2030, with chip production beginning between 2030 and 2031. The company's revised ...

The move was a shift in strategy for Intel, which lagged rivals in adopting the previous generation of extreme ultraviolet (EUV) lithography machines. It took Intel seven years to put those ...

A major breakthrough at Peking University might have just found the first step beyond silicon for semiconductors.

Huawei, SMIC reportedly advancing LDP lithography, eye 3Q25 trial, 2026 rollout China is making significant strides in ...

Irresistible Materials, Ltd (IM), a leader in the development of novel resist materials for extreme ultraviolet (EUV) ...

The tech sector has been getting hammered so far this year, down 10.5% at the time of this writing, which is slightly worse ...