In e-beam lithography, or EBL, shapes are drawn onto a wafer using an electron beam in a vacuum chamber. This is a slow process compared to optical lithography, as used in mass production ...
Yet unlike software, where industry leadership can shift in a matter of months, success in lithography is a slow-moving race ...
Extreme ultraviolet lithography extends photolithography ... a single fingerprint on the wall of the vacuum chamber could put the whole system out of specification. These practices must be applied ...