For materials used at present, the immersion fluid used is water ... DUV lithography remains the main technology for the next one or two nodes (feature sizes prescribed by Moore's law) or EUV ...

ASML Holding N.V. (ASML) and imec, a research and innovation hub in nanoelectronics and digital technologies, announce that they have signed a new strategic partnership agreement, focusing on research ...

NA EUV, DUV (deep ultraviolet) immersion, YieldStar optical metrology, and HMI single- and multi-beam technologies. ASML is the sole global supplier of extreme ultraviolet lithography and ...

2000i and subsequent DUV immersion systems, ASML pointed out, plus sales of ASML's extreme ultraviolet lithography (EUV) systems are also subject to license requirements, primarily affecting ...

using ASML systems including 0.55 NA EUV, 0.33 NA EUV, DUV immersion, YieldStar optical metrology and HMI single- and multi-beam technologies. These tools will be installed in imec’s state-of-the-art ...

using ASML systems including 0.55 NA EUV, 0.33 NA EUV, DUV immersion, YieldStar optical metrology and HMI single- and multi-beam technologies. These tools will be installed in imec’s pilot line ...

ASML will contribute its full product portfolio, including advanced tools such as 0.55 NA EUV, 0.33 NA EUV, DUV immersion, YieldStar optical metrology, and HMI single- and multi-beam technologies.

ASML-imec deal; Intel Foundry's future; European tech consortium; photonics-related acquisitions; global chip market up; new ...

“The Dutch export license requirement is already in place for the Twinscan NXT:2000i and subsequent DUV immersion systems. Sales of ASML’s EUV systems are also subject to license requirements.

The partnership will see ASML’s semiconductor systems, including 0.55 NA EUV, 0.33 NA EUV, DUV immersion, YieldStar optical metrology and HMI single- and multi-beam technologies, installed at ...

ASML and imec sign strategic partnership agreement to support semiconductor research and sustainable innovation in Europe Veldhoven (the ...

focusing on developing high-end nodes using ASML systems, including 0.55 NA EUV, 0.33 NA EUV, DUV immersion, YieldStar optical metrology, and HMI single- and multi-beam technologies. These tools ...