Intel has started using two leading-edge ASML High-NA Twinscan EXE:5000 EUV lithography tools, the company revealed on Monday at an industry conference, Reuters reports. The company uses these ...
High-NA EUV machine from ASML, a move expected to address production challenges and improve the performance of its upcoming ...
High-NA EUV machine to its Hwaseong Campus in South Korea, which is reportedly necessary for the manufacturing of the 2nm ...