Figure 2: The lens for DUV photolithography with the highest NA: Starlith 1900 from Carl Zeiss. The height of the lens is more than 1 m. The optical design and ray path are schematics and given ...

DUV lithography uses light with wavelengths of 248 and 193 nm while EUV lithography is a technology unique to ASML and uses light with a wavelength of 13.5 nm, which is 14x shorter than DUV.

Optical lithography applying deep ultra violet (DUV) and even extreme ultra violet (EUV) light allows to manufacture chips at structure sizes 4,000 times thinner than a human hair or, more ...

ASML’s first EUV lithography tools, scheduled to ship to customers early next year and go into full semiconductor wafer production in 2014, will be able to manufacture structures as small as 20 nm.

One of the deep ultraviolet (DUV) lithography machines operates at a wavelength of 193 nanometres (nm), with a resolution ...

ASML buys 24.9% of ZEISS subsidiary Carl Zeiss SMT for EUR 1 billion in cash Start of development of entirely new High NA optical system for the future generation of EUV ASML supports Carl Zeiss ...

To mitigate the impact of Dutch export restrictions on Chinese chipmakers, ASML's Chinese customers were expecting that the Netherlands-based lithography machine maker may release a variant of its ...

The two machines are deep ultraviolet (DUV) lithography devices featuring argon fluoride lasers. One operates at a 193nm wavelength, offering a resolution below 65nm and an overlay accuracy under 8nm.

The following statement was released by ASML <ASML.AS>: ASML, Zeiss and Canon Cross-License Lithography Equipment Patent Portfolios <ASML.O> Skip to main content ...