Figure 2: The lens for DUV photolithography with the highest NA: Starlith 1900 from Carl Zeiss ... lithography yet further, and these will now be discussed. The current maximum NA for projection ...

German company will lead a new effort to shrink extreme ultraviolet (EUV) lithography resolution from 20 nm ... for even smaller structures than that in the future, and the objective of the Zeiss-led ...

ASML supports Carl Zeiss SMT`s R&D and capex for approximately EUR 760 million over the next 6 years VELDHOVEN, the Netherlands/OBERKOCHEN, Germany - 3 November 2016 ...

China's best Lithography Optics is the Cnepo Epolith A075 with resolution of 90nm. China having problems developing projection lens technology equivalent to Carl Zeiss. The latest Japanese DUV ...