Figure 2: The lens for DUV photolithography with the highest NA: Starlith 1900 from Carl Zeiss ... lithography yet further, and these will now be discussed. The current maximum NA for projection ...

Our primary objective is to assess the landscape of DUV lithography in the context of advanced chip process nodes, and to explore any credible competitors challenging ASML. We specifically ...

German company will lead a new effort to shrink extreme ultraviolet (EUV) lithography resolution from 20 nm ... for even smaller structures than that in the future, and the objective of the Zeiss-led ...

ASML supports Carl Zeiss SMT`s R&D and capex for approximately EUR 760 million over the next 6 years VELDHOVEN, the Netherlands/OBERKOCHEN, Germany - 3 November 2016 ...

Quality is also a key objective ... nanometer sizes. Lithography systems include extremely complex and ultra-precisely shaped aspherical lenses (DUV) and mirrors (EUV). ZEISS SMT is a ...