Intel has taken an early lead in High-NA EUV lithography, but widespread adoption remains constrained by high tool costs, ...

Extreme-ultraviolet (EUV) lithography at 13.5 nm is expected to be introduced in high-volume semiconductor chip production over the next three years. Research is now underway to investigate sub-10 ...

ASML is the sole producer of cutting-edge EUV lithography machines for advanced 3nm chip manufacturing. How secure is that ...

In EUV lithography, and especially high-numerical-aperture EUV, balancing tradeoffs between resolution, sensitivity and line-width roughness is becoming increasingly difficult. Lithography patterning ...

with no additional runtime required and no need for additional offline computations for mask process corrections (MPC), even for reticles that are 100% curvilinear patterns. In addition to many papers ...

It is used for research into materials such as optics, reticles, and pellicles, in collaboration with various parties in the EUV lithography field, including materials suppliers, end users, and ...

These are the most-read DIGITIMES Asia stories from the week of March 10 – March 15. China's EUV breakthrough: Huawei, SMIC reportedly advancing LDP lithography, eye 3Q25 trial, 2026 rollout ...

ASML also improved the reticle stage for a 4X speed improvement ... to complement and improve the single-patterning capabilities of EUV lithography. "And I would just add, it's not like ASML ...